| 摘要 |
electron-beam processing of objects. SUBSTANCE: device has electronproducing radiation source, stage mounting masked membrane made in the form of reusable selectively activated low-energy diamond film, accelerating electrode, optoelectronic and image correction systems, and resist-covered specimen stage. Diamond film is resistant to impact of air, is capable of picking high-density currents off surfaces, and incorporates ability of secondary-emission electron energy spread. System is placed in vacuum chamber. Diamond membrane and specimen mounting stages may be provided with adjustment and displacement facilities. Accelerating electrode made in the form of grid is free to move within its plane. Radiation source may be made in the form of electron source or ultraviolet radiation source. Diamond film may be deposited onto substrate made of material transparent for electron-generating rays. EFFECT: facilitated process, improved quality of pattern due to reduced chromatic aberrations in system. 4 cl, 1 dwg |
