发明名称 |
PHOTOPOLYMERIZABLE COMPOSITION FOR NEAR-INFRARED LASER EXPOSURE, PHOTOPOLYMERIZABLE PLANOGRAPHIC PRINTING PLATE, AND METHOD FOR PRODUCING PRINTING PLATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a photopolymerizable composition for a near-infrared laser, having high sensitivity and superior visible image properties. SOLUTION: In the photopolymerizable composition for near-infrared laser exposure containing (A) an ethylenically unsaturated compound, (B) a cyanine- sensitizing dye and/or a phthalocyanine-sensitizing dye having a structure, in which heterocycles are bonded to each other by way of a polymethine chain and (C) a compound, containing an organoboron anion and/or a halomethyl group, (D) 3-20 wt.% coloring dye, having absorption maximum at 450-650 nm is contained. |
申请公布号 |
JP2002156751(A) |
申请公布日期 |
2002.05.31 |
申请号 |
JP20000369416 |
申请日期 |
2000.12.05 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
OKAMOTO HIDEAKI;KOBORI KAZUHIRO |
分类号 |
G03F7/004;C08F2/50;G03F7/00;G03F7/027;G03F7/029 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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