发明名称 PHOTOPOLYMERIZABLE COMPOSITION FOR NEAR-INFRARED LASER EXPOSURE, PHOTOPOLYMERIZABLE PLANOGRAPHIC PRINTING PLATE, AND METHOD FOR PRODUCING PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a photopolymerizable composition for a near-infrared laser, having high sensitivity and superior visible image properties. SOLUTION: In the photopolymerizable composition for near-infrared laser exposure containing (A) an ethylenically unsaturated compound, (B) a cyanine- sensitizing dye and/or a phthalocyanine-sensitizing dye having a structure, in which heterocycles are bonded to each other by way of a polymethine chain and (C) a compound, containing an organoboron anion and/or a halomethyl group, (D) 3-20 wt.% coloring dye, having absorption maximum at 450-650 nm is contained.
申请公布号 JP2002156751(A) 申请公布日期 2002.05.31
申请号 JP20000369416 申请日期 2000.12.05
申请人 MITSUBISHI CHEMICALS CORP 发明人 OKAMOTO HIDEAKI;KOBORI KAZUHIRO
分类号 G03F7/004;C08F2/50;G03F7/00;G03F7/027;G03F7/029 主分类号 G03F7/004
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