发明名称 MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To efficiently and easily select semiconductor devices, and to reduce a manufacturing cost. SOLUTION: In the semiconductor device formed by a MAP system, patterns 6 and 7 for defective identification are formed on the soldered-bump forming surfaces of a printed wiring board. These patterns 6 and 7 for defective identification represent patterns for a display identifying the defective semiconductor device, markings are put on the patterns 6 for defective identification when there is a defectiveness such as a defective wiring in the printed wiring board, and markings are put on the patterns 7 for defective identification when the defectiveness is generated in an assembly process. The markings are put on either of the patterns 6 or 7 for defective identification by flawing by a cutter or the like or the coating of ink or the like. Accordingly, the semiconductor device in the defective printed wiring board or a defective assembly can be removed efficiently in a short time.</p>
申请公布号 JP2002329813(A) 申请公布日期 2002.11.15
申请号 JP20010131574 申请日期 2001.04.27
申请人 HITACHI LTD 发明人 TSUTSUMI YASUKI;MIWA TAKASHI;KURODA HIROSHI
分类号 H01L23/12;H01L21/56;(IPC1-7):H01L23/12 主分类号 H01L23/12
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