发明名称 Projection optical system, a projection exposure apparatus, and a projection exposure method
摘要 A projection optical system that projects an image on a first side onto a second plane through a plurality of lenses includes the following elements in order from the first side to the second plane: a first lens group that has a negative refractive power, a second lens group that has a positive refractive power, a third lens group that has a negative refractive power, a fourth lens group that has an aperture stop in the optical path, and a fifth lens group that has a positive refractive power. A clear aperture of a lens surface or an outer diameter of a lens in the projection optical system has a relative maximum in the second lens group, a relative minimum in the third lens group, and a relative maximum in the third-fifth lens groups, and has only one significant minimum between the first side and the second plane.
申请公布号 US2003007138(A1) 申请公布日期 2003.01.09
申请号 US20010028711 申请日期 2001.12.28
申请人 NIKON CORPORATION 发明人 SHIGEMATSU KOJI;MIZUSAWA MASAYUKI;FUJISHIMA YOUHEI;MATSUMOTO MIHO
分类号 G02B13/24;G02B13/14;G02B13/18;G03F7/20;H01L21/027;(IPC1-7):G03B27/54 主分类号 G02B13/24
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