发明名称 |
Control of beam spot size in ellipsometer and the like systems |
摘要 |
Disclosed are system for and method of analyzing substantially the exact same spot size on a sample system with at least two wavelengths for which the focal lengths do not vary more than within an acceptable amount.
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申请公布号 |
US7345762(B1) |
申请公布日期 |
2008.03.18 |
申请号 |
US20050204835 |
申请日期 |
2005.08.15 |
申请人 |
J.A. WOOLLAM CO., INC. |
发明人 |
LIPHARDT MARTIN M.;JOHS BLAINE D.;WOOLLAM JOHN A.;MEYER DUANE E.;WELCH JAMES D. |
分类号 |
G01J4/00 |
主分类号 |
G01J4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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