发明名称 Control of beam spot size in ellipsometer and the like systems
摘要 Disclosed are system for and method of analyzing substantially the exact same spot size on a sample system with at least two wavelengths for which the focal lengths do not vary more than within an acceptable amount.
申请公布号 US7345762(B1) 申请公布日期 2008.03.18
申请号 US20050204835 申请日期 2005.08.15
申请人 J.A. WOOLLAM CO., INC. 发明人 LIPHARDT MARTIN M.;JOHS BLAINE D.;WOOLLAM JOHN A.;MEYER DUANE E.;WELCH JAMES D.
分类号 G01J4/00 主分类号 G01J4/00
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