METHOD OF FORMING CONDUCTIVE PATTERN INCLUDING CONDUCTIVE POLYMER AND MOTHOD OF MANUFACTURING MOLECULAR ELECTRONIC DEVICE USING THE SAME

摘要

A method for forming a conductive pattern including conductive polymer is provided to simplify the fabricating process of a molecular electronic device by easily forming a conductive pattern of a nano size including conductive polymer. A sacrificial mold pattern is formed on a substrate(100), covering a first region of the substrate. A metal thin film(120) is formed on the sacrificial mold pattern and a second region of the substrate not covered with the sacrificial mold pattern. An organic molecular layer(130) is formed on the metal thin film. A conductive polymer layer(140) is formed on the organic molecular layer. The sacrificial layer pattern in the first region is removed to form a plurality of conductive patterns composed of the metal thin film, the organic molecular layer and the conductive polymer layer that are left only in the second region. The sacrificial mold pattern can be made of a photoresist material.