发明名称 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive-type photosensitive resin composition having good mechanical properties and excellent storage stability by using a novolac resin. <P>SOLUTION: The positive-type photosensitive resin composition comprises (a) the novolac resin, (b) a polymer mainly composed of a structure represented by general formula (1) and/or (2), (c) a quinonediazide compound, (d) a compound having an alkoxymethyl group, and (e) a solvent. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008225457(A) 申请公布日期 2008.09.25
申请号 JP20080028520 申请日期 2008.02.08
申请人 TORAY IND INC 发明人 FUJITA YOJI;ARIMOTO SHINJI
分类号 G03F7/023;C08G73/10;G03F7/004;H01L21/027 主分类号 G03F7/023
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