LEVEL ADJUSTING APPARATUS OF SUBSTRATE PROCESSING APPARATUS AND LEVEL ADJUSTING METHOD USING THE SAME

摘要

The present invention relates to a level adjusting method for a level adjusting device of a substrate processing device, capable of accurately and simply adjusting a level of a support plate. According to the present invention, the substrate processing device includes: the support plate connected to a susceptor on which a substrate is mounted; a cam member applying a predetermined power to the support plate; and a driving unit separated at predetermined intervals from a rotation center of the cam member and including a rotation shaft rotating the cam member by being connected to the cam member. The level adjusting method includes: a step of setting a case in which the rotation center of the cam member and the rotation shaft are leveled by the rotation of the rotation shaft, as a reference height; a step of setting a range of a rotation angle of the rotation shaft to be less than the angle of 180 degrees when the rotation shaft rotates in a normal direction or a reverse direction at the reference height; and a step of lifting up and down the support plate by rotating the rotation shaft in either the normal direction or the reverse direction.