| 摘要 |
PURPOSE:To obtain the titled heating apparatus wherein the uniform heating is enabled and the generation of a slip is prevented and the design of a heating mechanism is easy by constituting it of a specified treatment chamber, a heating element, a supporting part of a substrate and a heating source. CONSTITUTION:A substrate 4 is provided on a supporting material 10 so that a rear surface of the substrate 4 is held with an adsorption tool and the adsorption tool is inserted into a notched part 11 of the supporting material 10 formed with carbon, Si, SiC, quartz or ceramic. A treatment chamber 2 wherein at least one part is formed with quartz is closed and a purge gas of N2, H2 is successively flowed in the direction shown by an arrow A and the inside of the treatment chamber 2 is made to the H2 atmosphere and electricity is supplied to a heating source 5 to generate the infrared beam having the value of wavelength in about 1mum. The substrate 4 and a heating element 31 made of carbon are irradiated in the uniform intensity with the infrared beam by means of a reflector 7. The titled heating apparatus is applied to the various gas phase growth apparatus such as a vertical type and a cylindrical type besides a lateral type gas phase growth apparatus and to the various heating apparatus such as an annealing apparatus.
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