| 摘要 |
PURPOSE:To enable imprint of the desired pattern to the desired position by selecting the optional pattern with a rotary mask and the optional reflecting angle with a rotary mirror and radiating beam. CONSTITUTION:The rotary mask 4 and rotary mirror 5 are rotated and when the optional mask 11 and the mirror 12 of the optional reflecting angle come to the irradiating position of beam 3, each mask 11 and mirror 12 are stopped with a controller 6. As the other way, the combination is preset and both may be rotated while corresponding with each other. At the time of projecting the beam 3 from a generator 1, the beam 3 through a reflecting mirror 2 for relaying passes through the optional mask 11 and is reflected with the optional mirror 12 and the desired pattern is imprinted to the desired position through a focus lens 7. Then, for difference of beam reflecting condition by the mirror of different reflecting angle, the beam is shifted in the wide range by changing the reflecting angle only a little. By this method, setting of the imprinting position is optionally executed and flexible imprint can be executed. |
