发明名称 |
Method for fabricating a vertical trench inductor |
摘要 |
A method of forming vertical trench inductor (10) includes providing a layer (11) and forming a plurality of trenches (12) vertically therein. The trenches (12) are filled with a conductive material (16) and etched using a photolithographically defined mask (17). The etching produces a conductive liner (18) covering two sidewalls (13) and a bottom surface (14) of the trench (12). A second conductive layer is formed and patterned to couple the conductive liner (18) covering a sidewall (13) of a first trench (12) to the conductive liner (18) of an opposite sidewall (13) of an adjacent trench (12) to form an inductive coil.
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申请公布号 |
US5372967(A) |
申请公布日期 |
1994.12.13 |
申请号 |
US19940236079 |
申请日期 |
1994.05.02 |
申请人 |
MOTOROLA, INC. |
发明人 |
SUNDARAM, LALGUDI M. G.;TRACHT, NEIL |
分类号 |
H01L27/08;(IPC1-7):H01L21/70;H01L27/00 |
主分类号 |
H01L27/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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