ALIGNER AND EXPOSING METHOD FOR LARGE-SIZED SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To accurately exposing a large-sized substrate without deflection caused by the gravity of an original plate (mask) by holding the original plate and a substrate to be exposed in a perpendicular direction and exposing them. SOLUTION: A glass substrate 130 is vacuum-absorbed and held on a substrate holding part 115 provided to be fixed on a stage 110 in a state where its surface coated with photosensitive material is set in the perpendicular direction. The mask 140 is also held by vacuum-absorbing the periphery part of its back surface by a mask holding part 116 in a state where its pattern surface is set in the perpendicular direction. The stage 110 is finely moved in X, Y, Z andθ(rotating) directions by X, Y and Z driving parts 111 to 113, and moved stepwise by a specified distance in X and Y directions. After aligning the substrate 130 and the mask 140 in a state where space between both of them is kept a specified gap, light from a light source part 150 is radiated from the back surface of the mask 140 to the substrate side so as to expose and transfer the pattern of the mask 140 to the photosensitive material on the substrate 130.