METHOD FOR PROCESSING FRONT SUBSTRATE OF PLASMA DISPLAY PANEL

摘要

PURPOSE: A method for processing a front substrate of a plasma display panel is provided to prevent the degradation of panel performance by performing an exposing step, a developing step, and a plasticity step within one process. CONSTITUTION: An ITO(Indium Tin Oxide) electrode(9) is formed on a front substrate(50). A black-colored photosensitive paste(51) is printed on an upper of the ITO electrode(9). The photosensitive paste(51) is comprised of Nickel oxide, Cobalt oxide, and Chromium Oxide to perform a black matrix function and a function of bus black-colored layer. A black-colored pattern photomask(52) for forming patterns of the bus black-colored layer and the black matrix is provided on the photosensitive paste(51) to be exposed to the ultraviolet. Then, a bus metallic paste(53) is printed on the photosensitive paste(51). A dielectric layer and a protective layer are sequentially formed on the front substrate(50) on which a bus electrode and the black matrix are formed so that the processing the front substrate(50) is completed.