发明名称 |
Galvanically producing microstructures on substrate comprises immersing substrate in electrolyte solution and forming contact sites on surface of substrate |
摘要 |
Galvanically producing microstructures on a substrate (1, 2) comprises immersing the substrate in an electrolyte solution (13) and forming contact sites (16) on the surface of the substrate to adjust an electrical current between the substrate and the electrode (12). The surfaces of the contact sites are used to enlarge the surfaces of the substrate. Preferred Features: The contact sites are formed by irradiating a photo lacquer applied to the surface of the substrate and removing the radiated and/or non-radiated regions of the photo lacquer in a lithographic process. |
申请公布号 |
DE10007108(C1) |
申请公布日期 |
2001.05.23 |
申请号 |
DE2000107108 |
申请日期 |
2000.02.17 |
申请人 |
ALCATEL SEL AG |
发明人 |
RICHTER, HORST;RUES, KARIN |
分类号 |
C25D7/12;H01L21/288;H01L21/3205;H01L21/60;H05K3/24;(IPC1-7):C25D7/00;B81C1/00;H05K3/00 |
主分类号 |
C25D7/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|