发明名称 Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube
摘要 This invention relates to an excimer laser oscillation apparatus which has a laser chamber which stores a laser gas containing a gas mixture of at least one inert gas selected from the group consisting of Kr, Ar, and Ne, and F2 gas, and in which an inner surface thereof has a reflection-free surface with respect to light of a desired wavelength of 248 nm, 193 nm, or 157 nm, and the uppermost surface of the inner surface consists of a fluoride, an optical resonator which is made up of a pair of reflection mirrors arranged to sandwich the laser chamber therebetween, and in which the reflectance of the reflection mirror on the output side is 90% or more and microwave introduction means, arranged on the laser chamber, for continuously exciting the laser gas in the laser chamber.
申请公布号 US6331994(B1) 申请公布日期 2001.12.18
申请号 US19970893977 申请日期 1997.07.16
申请人 CANON KABUSHIKI KAISHA;OHMI TADAHIRO 发明人 OHMI TADAHIRO;TANAKA NOBUYOSHI;HIRAYAMA MASAKI
分类号 H01S3/041;H01S3/08;H01S3/0975;H01S3/225;(IPC1-7):H01S3/097 主分类号 H01S3/041
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