发明名称 LOW VOLUME RESISTIVITY MATERIAL, ALUMINUM NITRIDE SINTERED COMPACT AND MEMBER FOR MANUFACTURING SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a material having low volume resistivity at a normal temperature using aluminum nitride sintered compact as a base. SOLUTION: The low volume resistivity material is composed of the aluminum nitride sintered compact consisting essentially of aluminum nitride and containing >=0.04 mol% samarium expressed in terms of oxide and contains a aluminum nitride phase and a samarium - aluminum oxide phase. The samarium - aluminum oxide phase produces a low resistivity layer along the grain boundary of aluminum nitride particles.
申请公布号 JP2003055052(A) 申请公布日期 2003.02.26
申请号 JP20010267588 申请日期 2001.09.04
申请人 NGK INSULATORS LTD 发明人 KATSUTA YUJI;YOSHIKAWA JUN;MASUDA MASAAKI;IHARA CHIKAFUMI
分类号 H01L21/00;C04B35/581;H01L21/683 主分类号 H01L21/00
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