发明名称 |
LOW VOLUME RESISTIVITY MATERIAL, ALUMINUM NITRIDE SINTERED COMPACT AND MEMBER FOR MANUFACTURING SEMICONDUCTOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a material having low volume resistivity at a normal temperature using aluminum nitride sintered compact as a base. SOLUTION: The low volume resistivity material is composed of the aluminum nitride sintered compact consisting essentially of aluminum nitride and containing >=0.04 mol% samarium expressed in terms of oxide and contains a aluminum nitride phase and a samarium - aluminum oxide phase. The samarium - aluminum oxide phase produces a low resistivity layer along the grain boundary of aluminum nitride particles. |
申请公布号 |
JP2003055052(A) |
申请公布日期 |
2003.02.26 |
申请号 |
JP20010267588 |
申请日期 |
2001.09.04 |
申请人 |
NGK INSULATORS LTD |
发明人 |
KATSUTA YUJI;YOSHIKAWA JUN;MASUDA MASAAKI;IHARA CHIKAFUMI |
分类号 |
H01L21/00;C04B35/581;H01L21/683 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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