RETICLE, METHOD OF MANUFACTURING RETICLE, ALIGNER AND METHOD OF EXPOSURE

摘要

PROBLEM TO BE SOLVED: To provide a reticle in which internal stresses in an absorber film are reduced, a method of manufacturing the same, and an aligner and a method of exposure using the reticle. SOLUTION: This reticle 10 comprises a multilayer film 12 for an X-ray reflector formed on a substrate 8, and an absorber film 14 formed on the multilayer film 12, wherein the absorber film 14, having a prescribed pattern, is composed of a substance having a large imaginary part in the complex index of refraction at the use wavelength region of the X-ray. The surface of the absorber film 14 has been irradiated with an Ar ion beam.