| 摘要 |
An insulated gate transistor comprising a first semiconductor region, a second semiconductor region comprising plural portions, a third semiconductor region, a fourth semiconductor region, a first insulation layer, control electrodes, a first main electrode, and a second main electrode, wherein a metallic wiring layer is provided on the first main surface plane via an insulating layer, plural regions insulated from the first main electrode are provided through said first main electrode, and the metallic wiring layer is connected electrically to the control electrode through the insulating layer via the region insulated from the main electrode. <IMAGE> |
