| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for transferring a pattern of subnanometer order on a heat resistant resin sheet having a glass transition temperature (Tg) of 220°C or more, and a heat resistant resin sheet produced by using the method.SOLUTION: According to the invention, there is provided a method for transferring a pattern of subnanometer order on a heat resistant resin sheet having a glass transition temperature (Tg) of 220°C or more including the steps of: preparing a mold having transfer patterns of subnanometer order; disposing a heat resistant resin sheet so as to contact with a transfer pattern surface of the mold; heating the heat resistant resin sheet; pressing the transfer pattern surface of the mold to the heat resistant resin sheet; and removing the heat resistant resin sheet from the mold. There is also provided a heat resistant resin sheet transferred patterns thereon by using the method.SELECTED DRAWING: Figure 3 |
