发明名称 Precision and apertures for lithographic systems
摘要 Aperture members are provided wherein there is thin 1-10 micrometer thick crystaline membrane that is surrounded by a frame of a bulk type crystalline material. The aperture being an opening through the membrane in a typical shape useful for device fabrication, such as a circle or pattern. The aperture member of the invention can be fabricated out of a typical silicon crystalline wafer in a process where doping in a region serves as an etch stop.
申请公布号 US2003049569(A1) 申请公布日期 2003.03.13
申请号 US20010940415 申请日期 2001.08.28
申请人 CORDES STEVEN ALAN;CORDES MICHAEL JAMES;SPEIDELL JAMES LOUIS;MANSFIELD SCOTT 发明人 CORDES STEVEN ALAN;CORDES MICHAEL JAMES;SPEIDELL JAMES LOUIS;MANSFIELD SCOTT
分类号 G03F1/16;G03F7/20;(IPC1-7):G02F7/00 主分类号 G03F1/16
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