发明名称 DESIGNING DEVICE FOR LSI MASK PATTERN
摘要 PURPOSE:To rapidly perform the correction of a mask pattern data, by performing the check of electrical connection, the extraction of a transistor circuit diagram, and the comparison of the transistor circuit diagram in real time, at the time of generating and correcting the mask pattern data. CONSTITUTION:By inputting the generating and correcting instruction of the mask pattern data from a keyboard device 3, and inputting a coordinate value from a tablet pen 5, observing a graphic display 2, the mask pattern data is stored in a disk device 6. Simultaneously with storing the data, the electrical connection is checked by a real time mask pattern verifying device 7, and the transistor circuit diagram is extracted from the mask pattern data by using a device stipulated data, and it is compared with a correct transistor circuit diagram, and those results are immediately displayed on a graphic display 8, then, error decision is performed. In such a way, it is possible to shorten a time required for the correction of the mask pattern data.
申请公布号 JPS63106870(A) 申请公布日期 1988.05.11
申请号 JP19860254108 申请日期 1986.10.23
申请人 MITSUBISHI ELECTRIC CORP 发明人 MIWA HISAHARU
分类号 G06F17/50 主分类号 G06F17/50
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