| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain image information which can reproduce a high-contrast image by forming a layer which contains chromium oxide as the base layer of a light shield layer, and patterning the layer in a specific shape and obtaining the light shield layer. SOLUTION: As the layer on which the light shield layer is based, the layer containing chromium oxide is formed by sputtering. In this case, a sputter target consisting of chromium is used and the ratio of an O2 flow rate in an atmospheric gas flow rate is gradually decreased from the start to the end of film formation. At this time, the rate of the O2 flow rate is so selected that the light shield layer can finally be formed which is higher in oxidation degree on the end surface on a light-transmissive substrate side than on the other end surface facing the end surface. Namely, the 'base layer of the light shield layer' is formed by making the oxidation degree of chromium oxide of the 'base layer of the light shield layer' larger on the end surface on the light- transmissive substrate side than on the other end surface facing the end surface.</p> |
