| 摘要 |
PURPOSE: An apparatus for stripping a photoresist is provided to reduce the process time and the manufacturing cost by stripping the photoresist without performing a photoresist ashing process. CONSTITUTION: A wafer is loaded in an inner container(11) installed in an outer container(8). A photoresist formed on the wafer is removed by a stripper(5). A stripper passage(20) is formed at a bottom of the outer container(8). A wafer holder(15) is coupled to one end of a shaft(14) connected to a motor(13). The motor(13) is mounted on a cover(12) of the outer container(8). The wafer is fixed on the wafer holder(15). The stripper(5), which is circulated through a tube(10), is injected onto the wafer in the inner container(11) by means of the motor(21), thereby removing the photoresist.
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