LIQUID TREATING DEVICE FOR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To keep a treating liquid so as not to lower the temp., while the treating liquid spreads on the whole surface of a substrate by supplying hot water to the back surface side of the substrate to heat to accurately control the temp. of the treating liquid supplied to the substrate in a wet process performed by supplying the treating liquid to the substrate as the substrate is rotated. SOLUTION: This treating liquid controlled to a prescribed temp. is supplied to the surface side 10a of the substrate 10 from a liquid supply nozzle and also the hot water is supplied to the back surface side 10b by forming a rotary shaft 12 for rotationally driving the substrate 10 into a hollow rotary shaft and arranging a substrate heating means 60 inside. The substrate heating means 60 is constituted of a hot water tank 61 provided with a heating means, a hot water pipe line 62 and a nozzle tip 63 provided at the tip of the hot water pipe line 62 and in the middle of the hot water pipe line 62, a temp. sensor 64, a pressure control valve 65 and a stop valve 66 are mounted successively from the tip side and plural hot water jetting ports 68 are opened on the conical surface of the nozzle tip 63.