发明名称 METHOD FOR DEPOSITING THIN FILM ONTO PLASTIC STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a thin film deposition method for depositing a uniform thin film onto a cylindrical plastic structure by a plasma chemical vapor deposition method. SOLUTION: The cylindrical plastic structure is set rotatably between an outer electrode being cylindrical inside and an inner electrode being cylindrical inside which is disposed within the outer electrode. Monomer gas is supplied between the film-deposition surface of the cylindrical plastic structure and the electrode facing it, and then high-frequency waves are applied between the above electrodes while rotating the cylindrical plastic structure to deposit thin film onto the desired surface of the plastic structure.
申请公布号 JP2002155369(A) 申请公布日期 2002.05.31
申请号 JP20000349230 申请日期 2000.11.16
申请人 TOPPAN PRINTING CO LTD 发明人 MATSUOKA TAKEYUKI;KAKEMURA TOSHIAKI;KASHIMA HIROTO;TSUJINO MANABU
分类号 B05D3/10;C23C16/40;C23C16/505;(IPC1-7):C23C16/505 主分类号 B05D3/10
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