发明名称 PHOTOCURABLE RESIN COMPOSITION AND ITS RESIN LAMINATE
摘要 PROBLEM TO BE SOLVED: To provide a photocurable resin composition for obtaining a resin laminate having the excellent scuff resistance and transparency together with the antibacterial property and the antistatic ability and to provide the resin laminate. SOLUTION: The resin composition comprises (A) a mixture comprising (a-1) a polymerizable compound having at least two aczyloyloxy groups and/or methacryloyloxy groups in a molecule and (a-2) a compound having anα,β- ethylenic unsaturated bond in a molecule, (B) an inorganic antibacterial agent, (C) a copolymer obtained from a quaternary ammonium compound and a compound having an unsaturated double bond and (D) a photopolymerization initiator. The resin laminate comprises the resin.
申请公布号 JP2002327005(A) 申请公布日期 2002.11.15
申请号 JP20010135218 申请日期 2001.05.02
申请人 MITSUBISHI RAYON CO LTD 发明人 KAWAI OSAMU;HATAKEYAMA HIROKI
分类号 B32B27/18;B32B27/26;B32B27/30;C08F2/44;C08F2/50;C08F265/00;(IPC1-7):C08F2/44 主分类号 B32B27/18
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