| 发明名称 |
Mask, mask manufacturing method, pattern forming apparatus, and pattern formation method |
| 摘要 |
A mask for forming a thin film having a first pattern against a film formation substrate, including: a nonmagnetic substrate having an aperture corresponding to the first pattern; and a magnetic film having a second pattern and arranged on the nonmagnetic substrate.
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| 申请公布号 |
US2006191864(A1) |
申请公布日期 |
2006.08.31 |
| 申请号 |
US20060362579 |
申请日期 |
2006.02.24 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
YOTSUYA SHINICHI |
| 分类号 |
B05D5/12;C23C14/04;C23C14/24;C23F1/00;H01L51/50;H05B33/10 |
主分类号 |
B05D5/12 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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