| 摘要 |
A collecting unit and a film formation apparatus for a semiconductor process are provided to prevent the collecting unit from clogging due to byproducts by installing a receiving mechanism, which allows collected byproducts to be in contact with cleaning gas from upper and lower sides, within the collecting unit. A collecting unit comprises a casing, a trap body(76), and a receiving mechanism(96). The casing having a gas inlet(74A) and a gas outlet(74B), is configured to form a part of the exhaust path. The trap body is removably disposed within the casing to collect a part of the byproducts contained in the exhaust gas and comprises a plurality of fins(86) arranged along a flow direction of the exhaust gas. Each of fins has a surface where a part of the byproducts is attached and trapped. The receiving mechanism is disposed within the casing to receive a part of the byproducts separated from the trap body or an inner surface of the casing, so that the part can be prevented from being accumulated on a bottom of the casing. The receiving mechanism allows the accumulated byproducts to be in contact with cleaning gas from upper and lower sides, and comprises a board having a plurality of vent holes where the cleaning gas passes therethrough.
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