| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask for a liquid crystal display element and a method for manufacturing a color filter using the photomask, particularly, a photomask, having a plurality of slit structures arranged in parallel with one another, along at least one side of a light shielding region or having a structure with an adjusted transmittance, and to provide a method for manufacturing a color filter using the photomask. <P>SOLUTION: The color filter manufactured by using the photomask of the present invention has less level difference on a boundary face of pixels segmented by a black matrix, which reduces the phenomenon of generating a gap difference between a color filter and a thin-film transistor in a liquid crystal cell. When a liquid crystal display element is manufactured by using the color filter, such effects are obtained that electric field characteristics can be improved without requiring another process or an optical or circuit compensation and that a contrast ratio is improved while reducing hue difference. <P>COPYRIGHT: (C)2009,JPO&INPIT |
