发明名称 GLASS SUBSTRATE FOR MASK BLANK AND MANUFACTURING METHOD FOR THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a glass substrate for a mask blank having high accuracy in measurement of flatness of a main surface and a manufacturing method for the same.SOLUTION: A glass substrate 10 for a mask blank has two main surfaces opposing to each other, where chamfered surfaces are provided around the main surfaces. Flatness of one main surface is equal to 100 nm or less, and in the one main surface and in the chamfered surface excluding a substrate corner part within a distance of 10 mm from an outer end in a two-dimensional projection shape of the chamfered surface 12 provided around the one main surface, a surge measured in an arbitrary 2-mm range in a direction parallel to one side of the two-dimensional projection shape immediately close to the chamfered surface is equal to 50 nm or less.SELECTED DRAWING: Figure 1
申请公布号 JP2016134509(A) 申请公布日期 2016.07.25
申请号 JP20150008498 申请日期 2015.01.20
申请人 ASAHI GLASS CO LTD 发明人 HIRABAYASHI YUSUKE;OKAMURA YUZO;UMEO NAOHIRO
分类号 H01L21/027;C03C19/00;G03F1/24;G03F1/60 主分类号 H01L21/027
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