Copper wiring forming method with Ru liner and Cu alloy fill

摘要

Provided is a method of forming a copper (Cu) wiring in a recess formed to have a predetermined pattern in an insulating film formed on a surface of a substrate. The method includes: forming a barrier film at least on a surface of the recess, the barrier film serving as a barrier for blocking diffusion of Cu; forming a Ru film on the barrier film by Chemical Mechanical Deposition (CVD); forming a Cu alloy film on the Ru film by Physical Vapor Deposition (PVD) to bury the recess; forming a Cu wiring using the Cu alloy film buried in the recess; and forming a dielectric film on the Cu wiring.

主权项

1. A method of forming a copper (Cu) wiring in a recess formed to have a predetermined pattern in an insulating film formed on a surface of a substrate, the method comprising:
forming a barrier film at least on a surface of the recess, the barrier film serving as a barrier for blocking diffusion of Cu; forming a Ru film on the barrier film by Chemical Mechanical Deposition (CVD); forming a Cu alloy film directly on the Ru film by Physical Vapor Deposition (PVD) to bury the recess; forming a Cu wiring using the Cu alloy film buried in the recess; andforming a dielectric film on the Cu wiring,
wherein the forming the Cu alloy film includes: supplying a plasma-generating gas into a processing chamber in which the substrate is received to generate plasma; scattering grains from a target made of the same material as that of the Cu alloy film; allowing the grains to pass through the plasma for ionization of the grains; and applying a bias power such that the ionized grains are attracted onto the substrate.