SILICON CONTAINING POLYMER, SILICON CONTAINING COMPOUND, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND PATTERN FORMING METHOD

摘要

Provided are: a silicon-containing composition for forming a resist underlayer; a silicon-containing polymer which constitutes the silicon-containing composition for forming a resist underlayer; and a silicon-containing compound. The silicon-containing polymer comprises one or more kinds among repeating units represented by general formula (1-1) and general formula (1-2), and a repeating unit represented by general formula (1-3) as a partial structure. Accordingly, the present invention provides a resist underlayer which can improve a binding property to the resist patterns formed regardless of negative development or positive development.