发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR CURING SOLDERING RESIST COATING FILM USING THE SAME AND SOLDERING RESIST COATING FILM
摘要 PURPOSE:To form a cured coating film excellent in characteristics and to unnecessitate a post-heat curing process or to enable changeover from post-heat curing to curing with active energy beams by using an org. peroxide having a carbonyl group in each molecule. CONSTITUTION:An org. peroxide having at least one carbonyl group in one molecule is used in this photosensitive resin compsn. A photosensitive component used has at least two unsatd. groups in one molecule and is, e.g. bisphenol A type epoxy resin provided with photosensitivity by adding unsaid. monocarboxylic acid such as acrylic acid, a resin provided with alkali solubility by introducing carboxyl groups by the addition of a dibasic acid anhydride such as maleic anhydride or an arom. polycarboxylic acid anhydride such as trimellitic anhydride or a resin obtd. by introducing unsatd. groups such as acryloyl groups into a (co)polymer of styrene or acrylic acid.
申请公布号 JPH0798505(A) 申请公布日期 1995.04.11
申请号 JP19930242923 申请日期 1993.09.29
申请人 NIPPON OIL & FATS CO LTD;TAIYO INK MFG LTD 发明人 UJIGAWA NORIHISA;TAKAMURA MASUMI;YODA KYOICHI;ONODERA SEIYA;TAKEHARA EIJI;KAKINUMA MASAHISA
分类号 G03F7/031;G03F7/038;G03F7/40;H05K3/28;(IPC1-7):G03F7/031 主分类号 G03F7/031
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