发明名称 MASS FLOW CONTROL DEVICE AND REAL GAS MASS FLOW CONTROL METHOD
摘要 PROBLEM TO BE SOLVED: To provide a mass flow control device and a real gas mass flow control method for controlling the flow of gas with high accuracy irrespective of the kind and properties of gas to be controlled. SOLUTION: The mass flow control device 1 has an inflow pipe part 2 into which real gas flows: a temperature sensor 7 detecting the temperature of real gas; a pressure sensor 8 detecting the pressure of the real gas; a flow sensor 5 detecting the mass flow of the real gas; a flow control valve 6 controlling the flow rate of the real gas; and a control circuit 9 regulating the opening of the flow control valve 6 based on the output of each sensor. The control circuit 9 has a digital arithmetic circuit 10 comparing a flow signal from the flow sensor 5 with a flow set value corrected with an environmental correction factor which is a ratio of real gas flow to the flow of calibration gas depending on pressure and temperature. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009087126(A) 申请公布日期 2009.04.23
申请号 JP20070257436 申请日期 2007.10.01
申请人 HITACHI METALS LTD 发明人 HAYASHI AKIHITO;FURUKAWA YOSHIYUKI;GOTO TAKAO;SUGIMOTO MASATO
分类号 G05D7/06;G01F1/00 主分类号 G05D7/06
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