| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a simple matching circuit for generating plasma, which can generate uniform plasma by high-frequency discharge by the high-frequency discharging current, can plasma process a dry etching as plasma etching or plasma CVD without sputtering. <P>SOLUTION: The matching circuit for generating plasma has coils and capacitors which feed high-frequency current to an electrode 2 and an electrode 3 via a port 15 and a port 16 respectively, make them produce discharging respectively and make them generate plasma. A coil 11 and a coil 12 are connected to the electrode 2 and the electrode 3 in series respectively and a capacitor 13 and a capacitor 14 are connected in parallel respectively between the port 15 and the port 16 disposing the coil 11 and the coil 12 between them. The electrodes 2 and 3 have same electrical potential. <P>COPYRIGHT: (C)2003,JPO |
