| 摘要 |
<P>PROBLEM TO BE SOLVED: To achieve two-dimensional or three-dimensional fabrication of an inorganic transparent material with 10 nm accuracy. <P>SOLUTION: Soft X-rays 2 emitted from a soft X-ray source 1 are condensed on an inorganic transparent material 4 in a prescribed pattern through an optical system 3 comprising a combination of a convex mirror and concave mirrors, new absorption is generated only in the irradiated portion of the transparent material 4 and the transparent material 4 is irradiated with laser light 5 for fabrication to absorb the visible or ultraviolet laser light 5 with high energy density only in the patterned portion of the transparent material 4, thereby achieving fabrication of the transparent material 4. <P>COPYRIGHT: (C)2003,JPO |
