摘要 |
<p>A resist composition comprising an alkali-soluble resin, a 1,2-quinone diazide compound and a compound of the general formula (I): <CHEM> wherein Z is an oxygen or sulfur atom or a group of the formula: >N-R4 in which R4 is a hydrogen atom or an alkyl group; R1, R2 and R3 are the same or different and independently a hydrogen atom, a substituted or unsubstituted alkyl group, a halogen atom, a hydroxyl group, a cyano group or a group of the formula: -OCOR'' in which R'' is a substituted or unsubstituted alkyl group; and X and Y are independently a cyano group or a group of the formula: <CHEM> -COOR or -CONHR' in which R is an alkyl group and R' is a hydrogen atom or an aryl group, which is suitable for the formation of very fine patterns on a substrate having a high reflectance.</p> |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
KITAO,TEIJIRO;MATSUOKA, MASARU;HANAWA, RYOTARO;UETANI, YASUNORI;TAKEYAMA, NAOKI;HIOKI, TAKESHI;TAKAGAKI, HIROSHI |