发明名称 |
RESIN COMPOSITION TREATMENT SOLUTION CONTAINING PHOSPHOR AND MANUFACTURE OF PHOSPHOR PATTERN |
摘要 |
PROBLEM TO BE SOLVED: To provide resin composition treatment solution containing a phosphor capable of improving a luminescent characteristic of a phosphor pattern and manufacture of the phosphor pattern with an excellent luminescent characteristic with a high yield. SOLUTION: This manufacturing method of the phosphor pattern comprises: a step of treating a pattern composed of a resin composition treatment solution containing a phosphor having an onium salt and a solvent and a resin composition containing a phosphor, formed on a substrate, by resin composition treatment solution containing the phosphor having the onium salt and the solvent; and a step of baking the pattern thus treated. |
申请公布号 |
JPH11233019(A) |
申请公布日期 |
1999.08.27 |
申请号 |
JP19980029374 |
申请日期 |
1998.02.12 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
KIMURA NAOKI;TAI SEIJI;SHIMAMURA MARIKO;TANAKA HIROYUKI;NOJIRI TAKESHI;SATO KAZUYA;HORIBE YOSHIYUKI;MURAMATSU YUKIKO |
分类号 |
G03F7/004;C09K11/00;G03F7/40;H01J9/227;(IPC1-7):H01J9/227 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|