发明名称 RESIN COMPOSITION TREATMENT SOLUTION CONTAINING PHOSPHOR AND MANUFACTURE OF PHOSPHOR PATTERN
摘要 PROBLEM TO BE SOLVED: To provide resin composition treatment solution containing a phosphor capable of improving a luminescent characteristic of a phosphor pattern and manufacture of the phosphor pattern with an excellent luminescent characteristic with a high yield. SOLUTION: This manufacturing method of the phosphor pattern comprises: a step of treating a pattern composed of a resin composition treatment solution containing a phosphor having an onium salt and a solvent and a resin composition containing a phosphor, formed on a substrate, by resin composition treatment solution containing the phosphor having the onium salt and the solvent; and a step of baking the pattern thus treated.
申请公布号 JPH11233019(A) 申请公布日期 1999.08.27
申请号 JP19980029374 申请日期 1998.02.12
申请人 HITACHI CHEM CO LTD 发明人 KIMURA NAOKI;TAI SEIJI;SHIMAMURA MARIKO;TANAKA HIROYUKI;NOJIRI TAKESHI;SATO KAZUYA;HORIBE YOSHIYUKI;MURAMATSU YUKIKO
分类号 G03F7/004;C09K11/00;G03F7/40;H01J9/227;(IPC1-7):H01J9/227 主分类号 G03F7/004
代理机构 代理人
主权项
地址