发明名称 SEMICONDUCTOR DEVICE, ELECTRO-OPTIC DEVICE AND ELECTRONIC APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a semiconductor device provided with a thin film transistor, wherein the level of an off-leakage current is low and the level of an on-state current is high. SOLUTION: In a TFT 10, a gate electrode 19 and a channel region 15 are respectively divided into a plurality of gate electrodes 19 and a plurality of channel regions 15 in the channel length direction, and at the same time, a first low-concentration intermediate region 111 and a second high-concentration intermediate region 112 are formed between the divided channel regions 15, and a drain low-concentration region 162 is made to adjoin the second channel region 152 positioned closest to the side of a drain region 17 during the divided channel regions 15.</p>
申请公布号 JP2000286422(A) 申请公布日期 2000.10.13
申请号 JP19990090004 申请日期 1999.03.30
申请人 SEIKO EPSON CORP 发明人 ITO TOMOYUKI
分类号 H01L29/786;G02F1/136;G02F1/1368;H01L21/336;(IPC1-7):H01L29/786 主分类号 H01L29/786
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