Plasma etching apparatus,申请号IL19960118342-传众专利搜索

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发明名称	Plasma etching apparatus
摘要
申请公布号	IL118342(A)	申请公布日期	2000.11.21
申请号	IL19960118342	申请日期	1996.05.21
申请人	LAM RESEARCH CORPORATION	发明人
分类号	H05H1/46;B01J19/08;C23C16/50;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H01J7/24;H01J7/00	主分类号	H05H1/46
代理机构		代理人
主权项
地址

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