| 摘要 |
An exposure apparatus includes a reticle stage for holding a reticle, a wafer stage for holding a wafer, and projection optical system for projecting a pattern of the reticle onto the wafer. The apparatus performs exposure by scanning both the reticle stage and the wafer stage with respect to the projection optical system, thereby transferring the pattern of the reticle onto a plurality of shot regions on the wafer in order. A plurality of shot regions arranged in a scanning direction on the wafer are intermittently exposed in order by scanning by moving the wafer stage without stopping it and skipping one or more shot regions without exposing them. In this skip period, the reticle stage is returned in the opposite direction to the direction of the scanning.
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