| 摘要 |
A method of coating a metal substrate, the method comprising the steps of forming the metal substrate, nitriding the substrate to form an oxide layer, and subsequently applying a metal compound coating comprising a titanium, zirconium, or aluminum compound using a vacuum chamber process such as physical vapor deposition (PVD) or chemical vapor deposition (CVD). Optionally, the process may include additional coating steps and/or a heat treatment step following the coating step(s). A polytetrafluoroethylene coating may also be added after the metal compound coating(s) and before any final heat treating. A coated metal substrate resulting from this process is also disclosed, wherein the metal substrate contains one or more metal compound layers of titanium, zirconium, or aluminum compounds, over a nitrided surface of the metal substrate.
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