| 摘要 |
<p>[PROBLEMS] To inspect a substrate in a short time at a high temperature in a TFT substrate inspecting apparatus. [MEANS FOR SOLVING PROBLEMS] The TFT substrate inspecting apparatus (1) is provided with an inspection chamber (4) for inspecting an introduced TFT substrate (9), and a load lock chamber (2) for introducing the TFT substrate into the inspection chamber. The load lock chamber (2) is provided with a heating means (10) for preheating the introduced TFT substrate, and the inspection chamber (4) is provided with a thermal insulating means (11) for keeping the temperature of the TFT substrate introduced from the load lock chamber. The TFT substrate in a high temperature state is introduced into the inspection chamber by preheating the TFT substrate (9) by the heating means (10), thus, substrate inspection is performed without requiring a mechanism for heating the substrate to a high temperature in the inspection chamber nor requiring a time to increase the temperature in the inspection chamber.</p> |
