发明名称 SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To reduce ON-resistance in a semiconductor device having a hetero-junction. SOLUTION: The device is configured so that the distance between a contact point (c) and a three overlapping point (a) may be smaller than the thickness of a gate insulating film 4. In the point (a), a drain region 2, a hetero-semiconductor region 3, and the gate electrode film 4 contact with each other. In the point (c), a normal line led from a gate electrode shortest point (b) where the distance between the point (a) and a gate electrode 5 is the shortest to a junction surface between the gate insulating film 4 and the drain region 2 contacts a junction surface. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007243062(A) 申请公布日期 2007.09.20
申请号 JP20060066492 申请日期 2006.03.10
申请人 NISSAN MOTOR CO LTD 发明人 HAYASHI TETSUYA;HOSHI MASAKATSU;SHIMOIDA YOSHIO;TANAKA HIDEAKI;YAMAGAMI SHIGEHARU
分类号 H01L29/78;H01L21/336;H01L29/12 主分类号 H01L29/78
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