发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 A method for preparing a semiconductor device is provided to suppress the bad effect of a siloxane component of low molecular weight, thereby improving the confidence of wire bonding process. A method for preparing a semiconductor device comprises the steps of coating a heat curing silicone-based dye bonding material on a substrate; arranging a semiconductor device on the coated surface of the substrate; heating the heat curing silicone-based dye bonding material to cure it; removing the siloxane component of low molecular weight adhered on the semiconductor device; and wire bonding it. Preferably the siloxane component of low molecular weight is removed by washing the semiconductor device with a solvent or by plasma treating the semiconductor device.
申请公布号 KR20070095799(A) 申请公布日期 2007.10.01
申请号 KR20070027461 申请日期 2007.03.21
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 MIYOSHI KEI
分类号 C08L83/07;H01L21/60 主分类号 C08L83/07
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