发明名称 Transistor structure with improved unclamped inductive switching immunity
摘要 A laterally diffused metal oxide semiconductor (LDMOS) transistor structure with improved unclamped inductive switching immunity. The LDMOS includes a substrate and an adjacent epitaxial layer both of a first conductivity type. A gate structure is above the epitaxial layer. A drain region and a source region, both of a second conductivity type, are within the epitaxial layer. A channel is formed between the source and drain region and arranged below the gate structure. A body structure of the first conductivity type is at least partially formed under the gate structure and extends laterally under the source region, wherein the epitaxial layer is less doped than the body structure. A conductive trench-like feed-through element passes through the epitaxial layer and contacts the substrate and the source region. The LDMOS includes a tub region of the first conductivity type formed under the source region, and adjacent laterally to and in contact with said body structure and said trench-like feed-through element.
申请公布号 US9425304(B2) 申请公布日期 2016.08.23
申请号 US201414465697 申请日期 2014.08.21
申请人 Vishay-Siliconix 发明人 Zhang Wenjie;Bobde Madhur;Chen Qufei;Terrill Kyle
分类号 H01L21/336;H01L29/78;H01L29/66;H01L29/40 主分类号 H01L21/336
代理机构 代理人
主权项 1. A semiconductor transistor structure, comprising: a substrate of a first conductivity type; an epitaxial layer adjacent to said substrate; a gate structure located above said epitaxial layer, a drain region of a second conductivity type within said epitaxial layer; a source region of said second conductivity type within said epitaxial layer; a body structure of said first conductivity type within said epitaxial layer at least partially formed under said gate structure and extending laterally under said source region; an electrically conductive trench-like feed-through element that passes through said epitaxial layer and contacts said substrate and passes through and contacts said source region; and a first tub region of said first conductivity type formed under said source region, and adjacent laterally to and in contact with said body structure, and wherein said first tub region is in contact with said trench-like feed-through element.
地址 Santa Clara CA US