发明名称 Thin film transistor substrate and organic light-emitting diode (OLED) display having the same
摘要 A thin film transistor substrate and an organic light-emitting diode (OLED) display are disclosed. In one aspect, the OLED includes a thin film transistor substrate. The thin film transistor substrate includes a substrate, a source electrode formed over the substrate, a drain electrode formed over the substrate and spaced apart from the source electrode, an oxide semiconductor layer, and a gate electrode. The oxide semiconductor layer includes a source area at least partially overlapping the source electrode, a drain area at least partially overlapping the drain electrode, and a channel area formed between the source area and the drain area. The gate electrode, which is insulated from the oxide semiconductor layer, has a first width at a first end thereof, a second width at a second end opposite to the first end thereof and the first width is different from the second width.
申请公布号 US9425251(B2) 申请公布日期 2016.08.23
申请号 US201414278235 申请日期 2014.05.15
申请人 Samsung Display Co., Ltd. 发明人 Kang Donghan;Kim Sunkwang;Kim Jaesik;Kim Hyeonsik;Jeong Woonghee;Choi Chaungi
分类号 H01L29/06;H01L27/32;H01L27/12;H01L29/786 主分类号 H01L29/06
代理机构 Knobbe Martens Olson & Bear LLP 代理人 Knobbe Martens Olson & Bear LLP
主权项 1. A thin film transistor substrate for a display device, comprising: a substrate; a source electrode formed over the substrate; a drain electrode formed over the substrate and spaced apart from the source electrode; an oxide semiconductor layer that includes i) a source area at least partially overlapping the source electrode, ii) a drain area at least partially overlapping the drain electrode, and iii) a channel area formed between the source area and the drain area; and a gate electrode insulated from the oxide semiconductor layer, wherein the oxide semiconductor layer has a first width at a first end thereof and a second width at a second end opposite to the first end thereof and the first width is different from the second width, wherein a width of the source area of the oxide semiconductor layer is substantially uniform and the drain area of the oxide semiconductor layer gradually increases in width from the channel area to the second end of the oxide semiconductor layer.
地址 Gyeonggi-do KR
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