发明名称 VACUUM SURFACE TREATING DEVICE
摘要 <p>PURPOSE:To improve treatment efficiency, by a method wherein at least two or more process chambers, having respective discharge systems and partitioned by respective partition valves, are situated in juxtaposition, and two or more chambers for inputting and outputting a base plate are situated in juxtaposition at each chamber through the medium of a second partition valve. CONSTITUTION:Two spatter chambers SP1 and SP2 with which a process chamber is formed are partitioned from each other by a partition valve V forming a first partition valve. Two each of chambers C1, C2, C3, and C4 for inputting and outputting a base plate are coupled to the spatter chambers SP1 and SP2, respectively, through partition valves V1-V4 each forming a second partition valve. The spatter chambers SP1 and SP2 and the chambers C1-C4 for inputting and outputting a base plate are connected to discharge systems P1-P6, respectively. Base plate conveying mechanisms T1 and T2 are situated to the spatter chambers SP1 and SP2, respectively, base plate inputting and outputting mechanism M1-M4 are mounted to the chambers C1-C4, respectively, in a manner to extend at right angles with the base plate conveying mechanisms, and base plate inputting and outputting mechanisms MC1-MC4 are mounted to the chambers C1-C4, respectively.</p>
申请公布号 JPH01177470(A) 申请公布日期 1989.07.13
申请号 JP19870329786 申请日期 1987.12.28
申请人 ULVAC CORP;TOSHIBA CORP 发明人 OBINATA HISAHARU;INOUE YOJI;ISHIZAKI JUNICHI;OKUMURA KATSUYA;ARAKI TOSHINOBU;MORI SHIGEYA
分类号 H01L21/203;C23C14/22;C23C14/56;F04B37/16;H01L21/302;H01L21/3065;H01L21/677;H01L21/68 主分类号 H01L21/203
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