| 摘要 |
PURPOSE:To obtain electrodes which can cope with a large screen and have a fine pattern excellent in its pattern shape by using photolithography to form an electrode line. CONSTITUTION:The slip 2 mixed with ultraviolet hardening resin 50 pts.wt. to a mixture of Ni powder and borosilicate glass powder 100 pts.wt. is coated on a glass substrate 1. Ultraviolet rays uv are radiated to places 4 where electrodes are to be formed with a glass mask 3 coated with the slip 2, and selective exposure is performed. A laminated electrode layer is developed, unexposed sections 5 are eluted, and the places 4 where electrodes are to be formed are left. When the patterned glass substrate 1 is baked, organic components are completely burned, and only inorganic components are left to form an electrode pattern 6. Since photography technique is used, a large size exceeding the A4 size is obtained regardless of the screen shape. |
