发明名称 Storage containers for lithography mask and method of use
摘要 A container is provided for storing a lithographic printing mask. A first container section is formed of a sturdy material which defines a central inner recess area that is shaped to house a mask and to hold outer edges of a mask without touching a pattern on the mask. A second identical container section is placed against the first container section with a mask housed within recesses of, both to form a container which has a common pressure level all around and therein. A higher pressure level is then applied outside the container causes the first and second sections of the container to be held together. To remove the mask from the container, the pressure outside the container is reduced to substantially the pressure level inside the container and the first and second sections are pulled apart.
申请公布号 US2003147063(A1) 申请公布日期 2003.08.07
申请号 US20030364282 申请日期 2003.02.10
申请人 APPLIED MATERIALS, INC. 发明人 GUO CHENG
分类号 G03B27/62;G03F7/20;(IPC1-7):G03B27/62 主分类号 G03B27/62
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